Nanoimprint Lithography (NIL) is one of the lithography technique where a predefined mould is used to mechanically create nanoscale (including microscale and even bigger) patterns. It is a very promising lithography technique to provide low cost while efficient nanopatterning. NIL has been proposed by Prof. Stephen Chou from Princeton University many years ago, and now it has evolved to many different models so that they can support wide range of applications.

This article would try to list the major research groups from universities, research institutes and labs around the world, as well as companies with NIL businesses. (We will come back to add more info and links to make this webpage aggregation of NIL info.)

Nanonex nanoimprint
Obducat
Rolith
Molecular imprint (now with Cannon with new name )
SUSS MicroTec
HP
Imprint Inc
EV Group (EVG)

China:

苏大维格
苏州光船鸵微纳科技
中科院光电所
无锡英普林纳米压印
东莞纳米压印

上海 纳腾仪器 (vendor)