Lithography Recipe for S1805 Positive Resist

Lithography Recipe for S1805 Positive Resist

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  • Spin coating 4000 rpm for 30 sec, results in about 0.5 µm film.
  • Prebake 115°C on hotplate for 4 min.
  • Exposure under UV illumination with a dose about 25mJ/cm2. (in our case 7.3mW/cm2 x 3.5 sec also works well).
  • Develop in MF319, about ~40 sec. 

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