Lithography Recipe for AZ5214 Image Reversal

 

  • Spin coating 5000 rpm for 30 sec, results in about 1.25 µm film.
  • Prebake 110°C on hotplate for 60 sec.
  • Exposure under UV illumination with a dose about 19mJ/cm2. (in our case 7.3mW/cm2 x 3sec also works well).
  • Post bake on hotplate 120°C for 2 min.
  • Flood illumination of UV with typical dose more than 200mJ/cm2. (in our case, 7.3mW/cm2 x 3sec also works well ).
  • Develop AZ400K 1:4, about ~20 sec. 

The postbake temperature is the most critical step in this lithography process, Refer: http://groups.mrl.uiuc.edu/dvh/pdf/AZ5214E.pdf

Some other recommended procedures include following links.

http://164.67.193.121/machinefiles/pdf/az5214.pdf

 http://www.ecse.rpi.edu/~schubert/Course-Teaching-modules/A36-The-photolithography-process.pdf

Image Reversal Recipe
o Clean the sample in a beaker filled with acetone, immediately followed by cleansing in a
beaker filled with IPA, immediately followed by cleaning in a beaker filled with DI H2O.
o Blow dry sample with an N2 gun.
o Dehydration bake 120oC for 3 minutes on a hot plate.
o Spin coat HMDS primer (if needed) at 7500 RPM for 35 seconds.
o Spin coat AZ 5214 E photoresist at 7500 RPM for 35 seconds.
o (PRE BAKE) Bake the sample at 90oC for 60 seconds on a hot plate.
o Expose sample under mask for 1 second at 19mW/cm2.
o (POST BAKE) Bake at 110oC for between 15 and 60 seconds on a hot plate.
o Flood expose for 60 seconds at 19mW/cm2.
o Develop in undiluted MIF 300 developer.

Positive PR Recipe
o Clean the sample in a beaker filled with acetone, immediately followed by cleansing in a
beaker filled with IPA, immediately followed by cleaning in a beaker filled with DI H2O.
o Blow dry the sample with an N2 gun.
o Dehydration bake 120oC for 3 minutes on a hot plate.
o Spin coat HMDS primer (if needed) at 7500 RPM for 35 seconds.
o Spin coat S1813 photoresist at 5000 RPM for 35 seconds.
o (PRE BAKE) Bake the sample 100oC for 60 seconds on a hot plate.
o Expose under mask for 4 seconds at 19mW/cm2.
o Develop in undiluted MIF 300 developer.
o (HARD BAKE) Bake 110oC for 3 minutes.

http://www.memsnet.org/pipermail/mems-talk/2002-January/005975.html

Here are a couple of Image Reversal recipes I use. I find that the second
one works a little better for me. Also, these are in shorthand, so some
things might be missing. The equipment I use may be different than what
you use, so don’t take it literally.

This is Junghoon’s recipe for image reversal with AZ 5214.

1. cleaning : 5:1 Piranha / 10 min –> rinse –> –> blow dry –> hot
plate 145~150C / 10 min
2. HMDS 3-4min
3. PR coating /AZ5214 / 4000rpm/ 30sec –> soft baking (100C, 1min)
4. Karl suss exposure / 16 ~ 18 sec (I= 6.0 mW/cm^2)
5. Hotplate 100C, 2 min
6. Flood exposure, 120 sec
7. Develop, AZ400K 1:5, short time (~20 sec.) –> hot plate 90C/ 20 sec

This is Cho’s recipe for image reversal with AZ 5214.

1. cleaning : 5:1 Piranha / 10 min –> rinse –> blow dry –> hot plate
145~150C / 10 min
2. HMDS 3-4min
3. PR coating /AZ5214 / 4000rpm/ 30sec –> soft baking (100C, 1min)
4. Karl suss exposure / 18 sec (I= 6.0 mW/cm^2)
5. Hotplate 100C, 45 sec
6. Flood exposure, 180 sec
7. Develop, AZ400K 1:5, short time –> hot plate 90C/ 20 sec
8. Hard Bake.

Jesse Fowler
  UCLA/MAE Dept., 420 Westwood Plaza, Room 18-121, ENGR IV
  Los Angeles, CA 90095-1597 | (310)825-3977
“Rule #6: There is no rule #6” — Monty Python
“ARTICLE SIX:  THIS ARTICLE IS ABOLISHED” — Constitution of Afghanistan

On Wed, 9 Jan 2002, shaoning wrote:

> Hello, everybody,
>
> Does anyone know the contact info of manufacturer or vendor of AZ5214
> photoresist? It is said it can be reversed from positive to negative polarity
> by different baking. Thank you very much for every information.
>
> Shaoning
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