Category : Nanofabrication

We published a post listing top 10 graphene companies in China a few days ago. Meanwhile, U.S. and Europe also have strong existence in graphene commercialization. Furthermore, graphene businesses in  U.S. and Europe tend to engage more advanced applications, including sensors, acoustics, optoelectronics, energy storage and harvesting, and so on. Below are featured graphene companies with […]

As a scientist or/and engineer working with nanotechnology, there are a lot of hardware development work and chemical related work, covering vacuum (UHV included), material synthesis, lithographical patterning, dry/wet etch, and material/device characterization. I often feel it would be of great help if there is a list of sources, not only giving out the major […]

Congratulation to Royole for its successful production of fully-flexible display in Royole Shenzhen fab, on June 6, 2018. This accomplishment was achieved after six years of endeavor and, the total investment is 6 billion RMB. Compared to those traditional panel makers who used similar technology to Korean surface display technology, Royole used independently developed process […]

Display technology has been progressed from heavy and big CRT to thin and potable flat panel display (FPD). FPD consists at least two types: TFT-LCD and AMOLED. Typical flexible display players are SONY, sharp, Samsung, LGD, Plastic Logic, UDC,  AUO and etc. Products such as G Flex by LG, curved OLED TV, Galaxy Edge, Galaxy […]

Nanoimprint Lithography (NIL) is one of the lithography technique where a predefined mould is used to mechanically create nanoscale (including microscale and even bigger) patterns. It is a very promising lithography technique to provide low cost while efficient nanopatterning. NIL has been proposed by Prof. Stephen Chou from Princeton University many years ago, and now […]

  Spin coating 4000 rpm for 30 sec, results in about 0.5 µm film. Prebake 115°C on hotplate for 4 min. Exposure under UV illumination with a dose about 25mJ/cm2. (in our case 7.3mW/cm2 x 3.5 sec also works well). Develop in MF319, about ~40 sec. 

  Spin coating 5000 rpm for 30 sec, results in about 1.25 µm film. Prebake 110°C on hotplate for 60 sec. Exposure under UV illumination with a dose about 19mJ/cm2. (in our case 7.3mW/cm2 x 3sec also works well). Post bake on hotplate 120°C for 2 min. Flood illumination of UV with typical dose more than 200mJ/cm2. (in our case, […]